日本金属学会誌

J. Japan Inst. Metals, Vol. 53, No. 8 (1989),
pp. 836-837

Discussion on Measuring Method of Hall Constant of Thin Films of Semiconducting Oxides

Li-Wei Zhang1 and Kazuhiro Silvester Goto2

1Graduate Student, Tokyo Institute of Technology, Tokyo. Present address: Steel Research Center, NKK Co. Ltd., Kawasaki
2Faculty of Engineering, Tokyo Institute of Technology, Tokyo} %\abst{} %\recdate{}{}{

Abstract:


(Received )

Keywords:

Hall constant, thin films, semiconducting oxides


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