Materials Transactions Online

Materials Transactions, Vol.49 No.05 (2008) pp.1186-1191
© 2008 The Japan Institute of Metals

Effects of Mg Additions on Microstructure and Optical Properties of Sol-Gel Derived ZnO Thin Films

Chien-Yie Tsay1, Min-Chi Wang1 and Shin-Chuan Chiang2

1Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan 40724, R.O.China
2Taiwan TFT LCD Association (TTLA), Hsinchu, Taiwan 31040, R.O.China

Polycrystalline thin-films of Zn1-xMgxO (0≤ x≤ 0.36) have been prepared by a sol-gel method and a spin-coating technique. In this work, the authors investigate the effects of the Mg addition on crystallization, microstructure and optical properties for ZnO thin films. Mg was incorporated into ZnO thin films that were deposited onto glass substrates by a spin coating technique. The as-deposited films were preheated at 300°C for 10 min and then annealed at 500°C for 1 h. The results show that addition of Mg-species in ZnO films markedly decreased surface roughness, improved transparency in the visible range and increased resistivity. Among the Zn1-xMgxO films investigated in the present study, the Zn0.8Mg0.2O thin film exhibited the best properties, namely single wurzite phase, an optical transmittance of 94.7%, an RMS roughness of 1.63 nm and a resistivity of 8.3× 105 Ω-cm.

(Received 2007/12/21; Accepted 2008/2/26; Published 2008/4/16)

Keywords: ZnO, Zn1-xMgxO thin films, optical properties, sol-gel method

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REFERENCES

  1. H. Ohta and H. Hosono: Materials Today 7 (2004) 42–51.
  2. J. F. Wager: Science. 300 (2003) 1245–1246.
  3. A. N. Banerjee, C. K. Ghosh, K. K. Chattopadhyay, H. Minoura, A. K. Sarkar, A. Akiba, A. Kamiya and T. Endo: Thin Solid Films. 496 (2006) 112–116.
  4. W. Li, Y. Sun, Y. Wang, H. Cai, F. Liu and Q. He: Solar Energy Mater. Solar Cells. 91 (2007) 659–663.
  5. B. Y. Oh, M. C. Jeong and J. M. Myoung: Appl. Surf. Sci. 253 (2007) 7157–7161.
  6. R. B. M. Cross and M. M. De Souza: Appl. Phys. Lett. 89 (2006) 263513.
  7. D. P. Norton, Y. W. Heo, M. P. Ivill, K. Ip, S. J. Pearton, M. F. Chisholm and T. Steiner: Materials Today 7 (2004) 34–40.
  8. F. Oba, T. Yamamoto, Y. Ikuhara, I. Tanaka and H. Adachi: Mater. Trans. 43 (2002) 1439–1443.
  9. T. W. Fang, S. C. Chiang, B. C. Chuang, C. H. Tsai, C. Y. Huang, C. C. Hsu, W. C. Lin, S. H. Lai and S. Y. Meng: Proceedings of International Display Manufacturing Conference (IDMC'07). (2007) pp.585–587.
  10. T. Hashimoto and T. Yoko: Mater. Trans. JIM 37 (1996) 435–441.
  11. L. Shen, D. Xiao, P. Yu, J. Zhu, D. Gao, G. Yu and W. Zhang: Mater. Trans. 44 (2003) 1324–1327.
  12. B. J. Norris, J. Anderson, J. F. Wager and D. A. Keszler: J. Phys. D: Appl. Phys. 36 (2003) L105–L107.
  13. E. Fortunato, P. Barquinha, A. Pimentel, A. Goncalves, A. Marques, L. Pereira and R. Martins: Thin Solid Films. 487 (2005) 205–211.
  14. J. H. Lee, P. Lin, C. C. Lee, J. C. Ho and Y. W. Wang: Jpn. J. Appl. Phys. 44 (2005) 4784–4789.
  15. Y. J. Chang, D. H. Lee, G. S. Herman and C. H. Chang: Electrochem. Solid-State Lett. 10 (2007) H135–H138.
  16. Y. Kwon, Y. Li, Y. W. Heo, M. Jones, P. H. Hollyway, D. P. Norton, Z. V. Park and S. Li: Appl. Phys. Lett. 84 (2004) 2685–2687.
  17. W. I. Park, G. C. Yi and H. M. Jang: Appl. Phys. Lett. 79 (2001) 2022–2024.
  18. J. W. Kim, H. S. Kang, J. H. Kim, S. Y. Lee, J. K. Lee and M. Nastasi: J. Appl. Phys. 100 (2006) 033701.
  19. Y. Ogawa and S. Fujihara: Phys. Stat. Sol. (a). 202 (2005) 1825–1828.
  20. D. J. Cohen, K. C. Ruthe and S. A. Barnett: J. Appl. Phys. 96 (2004) 459–467.
  21. T. Maemoto, N. Ichiba, S. Sasa and M. Inoue: Thin Solid Films. 486 (2005) 174–177.
  22. Dhananjay and S. B. Krupanidhi: Appl. Phys. Lett. 89 (2006) 082905.
  23. D. Zhao, Y. Liu, D. Shen, Y. Lu, J. Zhang and X. Fan: J. Crystal Growth. 234 (2002) 427–430.
  24. C. S. Suchand Sandeep, R. Philip, R. Satheeshkumar and V. Kumar: Appl. Phys. Lett. 89 (2006) 063102.
  25. B. D. Cullity and S. R. Stock: Elements of X-ray Diffraction, (Prentice-Hall, Inc, New Jersey, 2001) pp.388.
  26. A. Ohtomo, M. Kawasaki, T. Koida, K. Masubuchi, H. Koinuma, Y. Sakurai, Y. Yoshida, T. Yasuda and Y. Segawa: Appl. Phys. Lett. 72 (1998) 2466–2468.
  27. M. Ghosh and A. K. Raychaudhuri: J. Appl. Phys. 100 (2006) 034315.
  28. G. W. Scherer: J. Sol-Gel Sci. Tech. 8 (1997) 353–363.
  29. K. H. Kim, K. C. Park and D. Y. Ma: J. Appl. Phys. 81 (1997) 7764–7772.
  30. R. D. Tarey and T. A. Raju: Thin Solid Films. 128 (1985) 181–189.
  31. A. Sarkar, S. Ghosh, S. Chaudhuri and A. K. Pal: Thin Solid Films. 204 (1991) 255–264.
  32. J. Liu, W. Weng, W. Ding, K. Cheng, P. Du, G. Shen and G. Kan: Surf. Coat. Technol. 198 (2005) 274–277.
  33. R. L. Hoffman, B. J. Norris and J. F. Wager: Appl. Phys. Lett. 82 (2003) 733–735.


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