Kazutaka Fujita1, Taiji Suidu2, and Tohru Yamasaki3
1Department of Mechanical Engineering, Ube National College of Technology, Ube 755-8555
Nanocrystalline Ni-W alloy specimens containing 16.9 at% W with about 20 μm in thickness, 50 μm in width and 4 mm in parallel part length were produced by using both UV photolithography and electrodeposition methods. The average grain size was about 6 nm in diameter. The tensile test was conducted at a strain rate of 1.4 × 10-4 s-1. The nominal tensile strength and Young's modulus were about 2.8 GPa and about 125 GPa with or without polishing, respectively. The elastic strain and plastic strain on the polished specimen were about 1.9% and 0.76%, respectively and those on the non-polished specimen were about 1.9% and 0.49%, respectively. The true tensile strength on the polished and non-polished specimens were 3.8 GPa and 3.4 GPa, respectively. In addition, the stress-strain curve showed work hardening. The macroscopic fracture part yielded necking and the microscopic fracture surface showed dimple pattern.
nanocrystalline nickel-tungsten alloy, tensile strength, ultraviolet photolithography, electrodeposition methods, fractography
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