日本金属学会誌

J. Japan Inst. Metals, Vol. 74, No. 9 (2010),
pp. 610-613

Ion Bombardment Effects on Internal Stress of Magnetic Thin Films

Yoshiaki Shinohara1, Koji Makita1 and Yoshihito Matsumura2

1Department of Applied Science, Graduate School of Engineering, Tokai University, Hiratsuka 259-1292
2Department of Nuclear Engineering, School of Engineering, Tokai University, Hiratsuka 259-1292

Abstract:

This study examined the effect of argon ion bombardment on the internal stress of a nickel film. As a means of expressing the effect of ion bombardment, we propose an ion bombardment parameter based on the momentum of the ions. The magnitude of the ion momentum determined from the plasma potential was not dependent on the sputter power. With the increase in sputter power, the increase in the impingement frequency of nickel atoms onto the substrate was greater than the increase in the impingement frequency of Ar+ ions. It has become evident that the ratio of impingement argon ions to nickel particles onto the substrate mainly affects the variation in the ion bombardment parameter in relation to the sputter power. Thus, it has been demonstrated that the internal stress of a nickel film can be predicted using the ion bombardment parameter.


(Received 2010/5/10)

Keywords:

sputtering, ion bombardment, internal stress, magnetostriction


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