Shingo Masuda1,, Yoshihito Matsumura2 and Yoshitake Nishi1,2
1Department of Materials Science, Graduate School of Engineering, Tokai University, Hiratsuka 259-1292
SmFe2.4 alloy thin films were prepared by DC magnetron sputtering process at different substrate temperatures from 323 K to 623 K and at different Ar gas pressure from 0.5 to 1.0 Pa. The magnetostriction increased with decreasing of an Ar gas pressure as sputtering gas. On the other hand, the large magnetostriction was observed at high Ar gas pressure on heating at 623 K of high substrate temperature. The maximum value of magnetostriction over 1400 ppm at 1.2 MA/m was found in a Sm-Fe film prepared at 423 K of substrate temperature and at 0.5 Pa of argon gas pressure. This value was top data for the compressive (negative) magnetostrictive films up to now. From this result, it was concluded that the amount of a magnetostriction was strongly affected by change in the morphology of the thin film.
samarium, iron, morphology, magnetostriction, magnetron sputtering, film
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