日本金属学会誌

J. Japan Inst. Metals, Vol. 69, No. 8 (2005),
pp. 671-675

Influences of Residual Gas Pressure, Sputtering Gas Pressure and Substrate Temperature on Magnetostrictive Susceptibility of Sm-Fe Alloy Thin Films

Keisuke Takahashi1,, Shingo Masuda1,\footnotemark[1], You Tsukayama1,\footnotemark[1], Atsushi Kadowaki2,, Yoshihito Matsumura3 and Yoshitake Nishi1,2,3

1Department of Materials Science, School of Engineering, Tokai University, Hiratsuka 259-1292
2Department of Materials Science, Graduate School of Engineering, Tokai University, Hiratsuka 259-1292
3Graduate School of Science and Technology, Tokai University, Hiratsuka 259-1292

Abstract:

SmFe2.2 alloy films were prepared by magnetron sputtering process. High magnetostrictive susceptibility was found under low residual gas pressure and low sputtering gas pressure at reduced substrate temperatures (Ts/K)/(Tm/K) from 0.30 to 0.37, where Ts and Tm are substrate temperature and melting point of SmFe2.2 alloy, respectively. The residual gas pressure dependence of magnetostrictive susceptibility was mainly explained by rate of samarium oxidation. Based on morphological change in Thornton's model, contributions of sputtering gas pressure and substrate temperatures were discussed.


(Received 2005/3/1)

Keywords:

magnetostriction, susceptibility, samarium-iron, film, magnetronsputtering


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