日本金属学会誌

J. Japan Inst. Metals, Vol. 69, No. 8 (2005),
pp. 667-670

Effect of Residual Stress Induced by Ar Ion Irradiation on Magnetostriction of R-Fe(R: Tb, Sm) Thin Film

Mitsuaki Takeuchi1,, Yoshihito Matsumura2 and Hirohisa Uchida2

1Graduate School of Engineering, Tokai University, Hiratsuka 259-1292
2Department of Applied Science, School of Engineering, Tokai University, Hiratsuka 259-1292

Abstract:

Magnetostrictive properties of Ar ion-irradiated R-Fe(R: Tb, Sm) thin films were studied with respect to residual stress. Film samples were prepared by a magnetron sputtering. The film composition was Tb36Fe64 and Sm27Fe73 with amorphous structures. After the deposition, film samples were irradiated by Ar ions with an energy of 10 keV and a current density of 27-80 × 10-2 A/m2 up to 1 × 1022 ions/m2. Magnetostrictive susceptibility of the Tb36Fe64 film decreased with increasing ion current density by 55 × 10-2 A/m2, however, improved with high current density above 70 × 10-2 A/m2. Magnetostrictive susceptibility of Sm27Fe73 increased with increasing ion current density up to 55 × 10-2 A/m2. This was caused by increase of compressive stress induced by Ar ion irradiation with low current density and stress relaxation by increased temperature during irradiation with high current density. The magnetic properties were found profoundly influenced by stresses induced by competitive factors such as irradiation damage and thermal annealing effect.


(Received 2005/2/28)

Keywords:

giant magnetostriction, terbium, samarium, iron, thin film, magnetron sputtering, ion irradiation, residual stress, magnetostrictive susceptibility


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