日本金属学会誌

J. Japan Inst. Metals, Vol. 67, No. 10 (2003),
pp. 562-568

Investigation of Characteristics and Pretreatment Method of High Purity Silicon Sludge Filtrated from Wastewater of Silicon Industry
(Reuse Technology of High Purity Silicon Sludge---Part I)

Hakaru Nakato1, Minoru Nitta1, Ryoji Uchimura1, Hirohumi Iinuma2 and Hiroshi Uesugi2

1Process & Products Engineering Division, KAWASAKI STEEL Techno-research Corporation, Chiba 260-0835
2SANYO Aqua Technology Co., Ltd., Oizumi, Gunma 370-0596

Abstract:

Characteristics and pretreatment method for enrichment on silicon content of high purity silicon sludge filtrated from wastewater of silicon industry were investigated.

High purity silicon sludge consists of sub-micro fine particles and holding water with 15 to 40% in weight.

The content of oxygen in high purity silicon sludge is 2 to 10% and that of other impurities is extremely low.

Oxygen exists as silicon dioxide. It can be reduced to the level below 1% by hydrofluoric acid treatment or by reduction in solid state at elevated temperature over 1500 K in reduced atmosphere of 10-3--10-4 MPa.


(Received May 13, 2003)

Keywords:

silicon sludge, fine particle, oxygen removal, hydrofluoric acid, reduction


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