日本金属学会誌

J. Japan Inst. Metals, Vol. 63, No. 1 (1999),
pp. 62-67

Effects of Pressure on PbTiO3 Thin Film Preparedby Low-Pressure Thermal Plasma Deposition

Shingo Nagata1, Naoki Wakiya1, Kazuo Shinozaki1,Yoshio Masuda2 and Nobuyasu Mizutani1

1Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology, Tokyo 152-8552
2Superconductivity Research Laboratory, International Superconductivity Technology Center, Tokyo 135-0062

Abstract:

PbTiO3 thin films were prepared by low-pressure thermal plasma deposition method on (100)MgO substrates. The mists of the mixed solution of each metal alkoxides and 2-methoxyethanol were introduced into a plasma flame and deposited onto substrates. The constituent phases, the crystal texture and the surface morphology were drastically changed by the chamber pressure. Over 13332 Pa, single phase PbTiO3 films were obtained. They were grown epitaxially and their surface morphology was composed of rectangular shaped grains. The remnant polarization and coercive field of the film from the hysteresis loop were about 0.104 C⋅m-2 and 5.12 MV⋅m-1, respectively.


(Received july 22, 1998; In Final Form September 11, 1998)

Keywords:

lead titanate, low-pressure thermal plasma, thin film, mist, alkoxide, microstructure, hysteresis


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