日本金属学会誌

J. Japan Inst. Metals, Vol. 52, No. 9 (1988),
pp. 894-898

Electrical Properties of (Cr, Ti)Si2 Resistive Films for Thermal Printing Heads

Toshiki Kaneko1, Yoshiaki Kita1, Makoto Tsumura1 and Hisashi Andoh1

1Hitachi Research Laboratory, Hitachi, Ltd., Hitachi

Abstract:

High-resistivity (Cr, Ti)Si2 thin films favorable for the resistors of thermal printing heads have been prepared by DC magnetron sputtering. The electrical resistivities of (Cr1-xTix)Si2 films show a maximum value of 60 μ Ωm at x=0.37, which is three times larger than that of the CrSi2 film. By heating the as-deposited (Cr0.63Ti0.37)Si2 film up to 723 K, the resistivity increases by 15%. After it is once heated up to 723 K, there is no change in resistivity by the same heat treatment. Using the (Cr0.63Ti0.37)Si2 film, the resistors of thermal heads with an Al electrode and a SiO2 protective layer were constructed for the wax transfer printing. The resistors have a sufficient lifetime for the pulsed-current load test.
Devising the shape of the resistors, the half-tone printing covering a wide range of optical densities divided into 32 steps has been achieved.


(Received 1988/2/25)

Keywords:

resistive films, thermal printing heads, high resistivities, (Cr, Ti)Si2 alloys, half-tone printing, wax transfer printing


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