日本金属学会誌

J. Japan Inst. Metals, Vol. 52, No. 9 (1988),
pp. 865-871

Scratch Test of TiC and TiN Films Deposited on WC-Co Alloys

Jun-ichi Echigoya1, Zheng-tang Liu2, Hajime Suto1 and Tetsuji Tsukamoto3

1Department of Materials Processing, Faculty of Engineering, Tohoku University, Sendai
2Northwestern Polytechnical University, Xián, China. Now, Research Fellow, Tohoku University, Sendai
3Toshiba Tungaloy Co., Ltd., Kawasaki

Abstract:

Scratch test has been done for chemically vapor deposited (CVD) TiC and physically vapor deposited (PVD) TiN on WC-Co alloy substrates using the pyramidal indentator. The acoustic emission has been observed accompanied by cracking in the film and detaching of the film from the substrates at the interface. The AE singnals increased abruptly at the critical load at which the detachment began to occur and were constant after critical loading. The critical load corresponds to the detaching of the film from the substrates at the interface. The detached width after scratching also increased with load and was apart from the diagonal of the indentator from the critical load. The scratching depth at the critical load was 1/2--3/5 of the film thickness, which means the indentor did not reach the interface. These results were understood from the introduction of lateral cracks at the unloading by passing through the indentator.


(Received 1988/1/21)

Keywords:

coating, chemical vapor deposition, physical vapor deposition, titanium nitride, titanium carbide, adhesion, scratch test


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