日本金属学会誌

J. Japan Inst. Metals, Vol. 52, No. 9 (1988),
pp. 859-864

Growth and Interface Structure of TiC and TiN Films Deposited on WC-Co Alloys

Zheng-tang Liu1, Jun-ichi Echigoya2, Hajime Suto2 and Tetsuji Tsukamoto3

1Northwestern Polytechnical University, Xián, China. Now, Research Fellow, Tohoku University, Sendai
2Department of Materials Processing, Faculty of Engineering, Tohoku University, Sendai
3Toshiba Tungaloy Co., Ltd., Kawasaki

Abstract:

Using the transmission electron microscope, the growth morphology, orientation relationships and interface structure have been investigated for TiC and TiN films deposited on WC-Co alloys by chemical or physical vapor deposition (CVD or PVD). CVD-TiC films on the WC-Co alloys were grown in granular form and their interfaces were irregular. The TiC/WC orientation relationship was given as (0001)WC//(1 \bar11)TiC and [\bar1100]WC//[\bar112]TiC. PVD-TiN films on WC-Co alloy were grown in columnar form. TiN grains showed particular orientation relationships with WC grains. One of the relationships was the same as that observed for TiC/WC, and the other was [0001]WC//[1 \bar10]TiN, (10 \bar10)WC//(111)TiN. CVD-TiN films on the WC-Co alloys showed the change in growth morphology from the granual form at the initial stage of growth to the columnar form.


(Received 1988/1/21)

Keywords:

coating, titanium nitride, titanium carbide, chemical vapor deposition, physical vapor deposition


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