Zheng-tang Liu1, Jun-ichi Echigoya2, Hajime Suto2 and Tetsuji Tsukamoto3
1Northwestern Polytechnical University, Xián, China. Now, Research Fellow, Tohoku University, Sendai
Using the transmission electron microscope, the growth morphology, orientation relationships and interface structure have been investigated for TiC and TiN films deposited on WC-Co alloys by chemical or physical vapor deposition (CVD or PVD). CVD-TiC films on the WC-Co alloys were grown in granular form and their interfaces were irregular. The TiC/WC orientation relationship was given as (0001)WC//(1 \bar11)TiC and [\bar1100]WC//[\bar112]TiC. PVD-TiN films on WC-Co alloy were grown in columnar form. TiN grains showed particular orientation relationships with WC grains. One of the relationships was the same as that observed for TiC/WC, and the other was WC//[1 \bar10]TiN, (10 \bar10)WC//(111)TiN. CVD-TiN films on the WC-Co alloys showed the change in growth morphology from the granual form at the initial stage of growth to the columnar form.
coating, titanium nitride, titanium carbide, chemical vapor deposition, physical vapor deposition
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