日本金属学会誌

J. Japan Inst. Metals, Vol. 51, No. 4 (1987),
pp. 356-362

Self-activation of Passivated Titanium in Sulfuric Acid Solution

Woon Suk Hwang1, Katsuhiko Mushiake2 and Noboru Masuko2

1Graduate Student, The University of Tokyo, Tokyo
2Institute of Industrial Science, The University of Tokyo, Tokyo

Abstract:

The self-activation of passivated titanium was investigated in a sulfuric acid solution. The stability of the anodically formed film on a titanium surface was measured under several values of applied current densities ranging from cathodic to anodic. The reduction process of the film was affected additively by the applied current. Under various conditions two kinetic parameters, the amount of the charge accumulated in the film, Qo, and the rate of the self-activation process, io, were obtained with the linear relationship between density of the applied current and the inverse value of the activation time. The linear variation of Qo with the passivation potential (1.85×10 C•m-2•V-1) is attributed to the formation of a barrier-type film. The values of io depend on the conditions, by which the values of Qo are not affected, such as pH of the solution and passivation time. This result is explained in terms of the presence of defect in the films.


(Received 1986/11/17)

Keywords:

corrosion, titanium, passivation, barrier-type film, self-activation, sulfuric acid


PDF(Free)PDF (Free)     Table of ContentsTable of Contents

Please do not copy without permission.