Materials Transactions Online

Materials Transactions, Vol.58 No.05 (2017) pp.813-816
© 2017 The Japan Institute of Metals and Materials

Effect of Bias Sputtering on Magnetostrictive Property of Sm-Fe Thin Film

Shota Sakano1 and Yoshihito Matsumura2

1Course of Applied Science, Graduate School of Engineering, Tokai University, Hiratsuka 258-1292, Japan
2Department of Nuclear Engineering, School of Engineering, Tokai University, Hiratsuka 258-1292, Japan

The Sm-Fe thin films were prepared by a DC magnetron sputtering system installed the Langmuir probe with various substrate bias voltage. In this work, internal stress of the Sm-Fe thin films was investigated considering ion bombardment. The influence of ion bombardment on internal stress in films was estimated by the ion bombardment parameter (Pi). The Pi increased with increasing negative substrate voltage. Internal stress of Sm-Fe thin films showed a larger compressive stress with increasing amount of the Pi. The magnetostrictive susceptibility of Sm-Fe thin films was improved by increasing compressive stress. The magnetostrictive susceptibility of the Sm-Fe thin film was dependent on the Pi.

[doi:10.2320/matertrans.MBW201610]

(Received 2016/12/08; Accepted 2017/02/24; Published 2017/04/25)

Keywords: samarium iron alloy, sputtering, thin film, ion bombardment, internal stress, magnetostriction, magnetostrictive susceptibility

PDF(member)PDF (member) PDF(organization)PDF (organization) Order DocumentOrder Document Table of ContentsTable of Contents

REFERENCES

  1. S.H. Lim, Y.S. Choi, S.H. Han, H.J. Kim, T. Shima and H. Fujimori: J. Magn. Magn. Mater. 189 (1998) 1-7.
  2. H.H. Uchida, V. Koeninger, H. Uchida, M. Wada, H. Funakura, Y. Matsumura, T. Kurino and H. Kaneko: J. Alloy. Compd. 211-212 (1994) 455-459.
  3. H. Uchida, M. Wada, K. Koike, H.H. Uchida, V. Koeninger, Y. Matsumura, H. Kaneko and T. Kurino: J. Alloy. Compd. 211-212 (1994) 476-480.
  4. V. Koeninger, Y. Matsumura, H.H. Uchida and H. Uchida: J. Alloy. Compd. 211-212 (1994) 481-484.
  5. H. Yabe and Y. Nishi: J. Appl. Phys. 42 (2003) 96-99.
  6. F. Schatz, M. Hirscher and M. Schnell: J. Appl. Phys. 76 (1994) 5380-5382.
  7. D.W. Hoffman and M.R. Gaerttner: J. Vac. Sci. Technol. 17 (1980) 425-428.
  8. H. Windishmann: J. Appl. Phys. 62 (1987) 1800-1807.
  9. A. Kohri, F. Hayashida, Y. Shinohara and Y. Matsumura: J. Jpn. Inst. Metals 76 (2012) 355-358.
  10. R. Toyoda, S. Toya, M. Hashimoto, A. Kohri and Y. Matsumura: J. Jpn. Inst. Met. Mater. 78 (2014) 132-136.
  11. S. Miyata, R. Toyoda, M. Hashimoto, T. Iijima, A. Tonegawa and Y. Matsumura: J. Jpn. Inst. Met. Mater. 80 (2016) 280-283.
  12. H. Amemiya, M. Wada, H. Toyoda, K. Nakamura, A. Ando, K. Uehara, K. Oyama, O. Sakai and K. Tachibana: J. Plasma Fusion Res. 81 (2005) 482-522.
  13. M. Hashimoto, R. Toyoda and Y. Matsumura: J. Japan Inst. Met. Mater. 80 (2016) 663-666.
  14. G.G. Stoney: Proc. R. Soc. Lond. A 82 (1994) 172-175.
  15. J.J. Wortman and R.A. Evans: J. Appl. Phys. 36 (1965) 153.
  16. A.C. Tam and H. Schoroeder: J. Appl. Phys. 64 (1988) 5422.
  17. A.C. Tam and H. Schroeder: IEEE Trans. Magn. 25 (1989) 2629-2638.
  18. A. E. Clark: Ferromagnetic Materials, 1 (1980), Chap. 7.
  19. K. Makita, M. Takeuchi, M. Sato, H. Uchida and Y. Matsumura: Appl. Surf. Sci. 256 (2009) 1265-1267.
  20. Z. Wang, J. Liu, C. Jiang and H. Xu: J. Appl. Phys. 108 (2010) 063908.
  21. S. Tsunashima, H. Takagi, K. Kamegaki, T. Fujii and S. Uchiyama: IEEE Trans. Magn. 14 (1978) 844-846.
  22. M. Takeuchi, Y. Matsumura and H. Uchida: J. Jpn. Inst. Metals 69 (2005) 667-670.


[JIM HOME] [JOURNAL ARCHIVES]

© 2017 The Japan Institute of Metals and Materials
Comments to us : editjt@jim.or.jp