Materials Transactions Online

Materials Transactions, Vol.58 No.03 (2017) pp.494-498
© 2017 The Japan Institute of Metals and Materials

Design and Fabrication of Wire Grid Polarizer by Nanoimprinting and Glancing Angle Deposition Processes

Hyungjun Jang1, Ga-Young Shin1, Ho-Young Jang1, Jonghyun Ju1, Jiseok Lim2 and Seok-min Kim1

1School of Mechanical Engineering, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul 06974, Republic of Korea
2School of Mechanical Engineering, Yeungnam University, 280 Daehak-ro, Gyeongsan-si, Gyeongsangbuk-do 38541, Republic of Korea

We report a simple and cost-effective fabrication method for a wire grid polarizer. The wire grid polarizer was fabricated by incorporating UV nanoimprinting and glancing angle deposition processes. A silicon pattern with a 40 nm line width, 100 nm pitch, and 100 nm height was fabricated by electron beam (E-beam) lithography and reactive ion etching processes. The UV nanoimprinting process was performed on a glass substrate and aluminum nanowires, with a height of 70 nm, were subsequently generated with a glancing angle deposition process. P-polarization transmittance above 55% and an extinction ratio of 31.1~6.1 were measured in the visible wavelength range.

[doi:10.2320/matertrans.M2016219]

(Received 2016/06/14; Accepted 2016/12/13; Published 2017/02/25)

Keywords: wire grid polarizer, nano metal wire fabrication, glancing angle deposition, ultraviolet nanoimprinting

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