Materials Transactions Online

Materials Transactions, Vol.48 No.08 (2007) pp.2104-2107
© 2007 The Thermoelectrics Society of Japan

Thermoelectric Properties of the Layered Cobaltite Ca3Co4O9 Epitaxial Films Fabricated by Topotactic Ion-Exchange Method

Kenji Sugiura1, Hiromichi Ohta1,2, Kenji Nomura3, Tomohiro Saito4, Yuichi Ikuhara5, Masahiro Hirano3, Hideo Hosono3,6 and Kunihito Koumoto1,2

1Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
2CREST, JST, Kawaguchi 332-0012, Japan
3ERATO-SORST, JST, in Frontier Collaborative Research Center, Mail-box S2-13, Tokyo Institute of Technology, Yokohama 226-8503, Japan
4Materials R & D Laboratory, Japan Fine Ceramics Center, Nagoya 456-8587, Japan
5Institute of Engineering Innovation, The University of Tokyo, Tokyo 113-8656, Japan
6Frontier Collaborative Research Center, Mail-box S2-13, Tokyo Institute of Technology, Yokohama 226-8503, Japan

To clarify the thermoelectric properties of the layered cobalt oxide Ca3Co4O9 epitaxial film fabricated by the topotactic ion-exchange method [K. Sugiura et al., Appl. Phys. Lett. 89, 032111 (2006)], the electrical resistivity (ρ), Hall coefficient (RH), and Seebeck coefficient (S) of high quality Ca3Co4O9 epitaxial film were examined over the temperature range 10–1000 K. The film exhibited a low ρ of 4.0× 10-3 Ω cm and a large S of ∼+200 μV K-1, which leads to the thermoelectric power factor of 1.0× 10-3 W m-1 K-2, at 1000 K. Furthermore, the film exhibited good thermal stability at 1000 K in air.

(Received 2006/12/10; Accepted 2007/5/22; Published 2007/7/11)

Keywords: thermoelectric properties, layered cobaltite, epitaxial film, topotactic ion-exchange method, reactive solid-phase epitaxy

PDF(Free)PDF (Free) Table of ContentsTable of Contents


  1. T. M. Tritt, M. A. Subramanian, H. Bottner, T. Caillat, G. Chen, R. Funahashi, X. Ji, M. Kanatzidis, K. Koumoto, G. S. Nolas, J. Poon, A. M. Rao, I. Terasaki, R. Venkatasubramanian and J. Yang: in Harvesting Energy Through Thermoelectrics: Power Generation and Cooling, special issue of MRS Bull. 31 (2006) 188, and references therein.
  2. I. Terasaki, Y. Sasago and K. Uchinokura: Phys. Rev. B 56 (1997) 12685.
  3. M. Lee, L. Viciu, L. Li, Y. Wang, M. L. Foo, S. Watauchi, R. A. Pascal Jr, R. J. Cava and N. P. Ong: Nat. Mater. 5 (2006) 537.
  4. R. Ishikawa, Y. Ono, Y. Miyazaki and T. Kajitani: Jpn. J. Appl. Phys., Part 2 41 (2002) L337.
  5. K. Sugiura, H. Ohta, K. Nomura, M. Hirano, H. Hosono and K. Koumoto: Appl. Phys. Lett. 88 (2006) 082109.
  6. A. C. Masset, C. Michel, A. Maignan, M. Hervieu, O. Toulemonde, F. Studer and B. Raveau: Phys. Rev. B 62 (2000) 166.
  7. M. Shikano and R. Funahashi: Appl. Phys. Lett. 82 (2003) 1851.
  8. P. Limelette, V. Hardy, P. Auban-Senzier, D. Jèrome, D. Flahaut, S. Hèbert, R. Frèsard, Ch. Simon, J. Noudem and A. Maignan: Phys. Rev. B 71 (2005) 233108.
  9. J. P. Dismukes, L. Ekstrom, E. F. Steigmeier, I. Kudman and D. S. Beers: J. Appl. Phys. 35 (1964) 2899.
  10. I. Nishida: Phys. Rev. B 7 (1973) 2710.
  11. H. Nagai: Mater. Trans., JIM 36 (1995) 365.
  12. G. Xu, R. Funahashi, M. Shikano, I. Matsubara and Y. Zhou: Appl. Phys. Lett. 80 (2002) 3760.
  13. T. Tani, H. Itahara, C. Xia and J. Sugiyama: J. Mater. Chem. 13 (2003) 1865.
  14. M. Mikami, K. Chong, Y. Miyazaki, T. Kajitani, T. Inoue, S. Sodeoka and R. Funahashi: Jpn. J. Appl. Phys. 45 (2006) 4131.
  15. K. Sugiura, H. Ohta, K. Nomura, M. Hirano, H. Hosono and K. Koumoto: Appl. Phys. Lett. 89 (2006) 032111.
  16. Y. Miyazaki, M. Onoda, T. Oku, M. Kikuchi, Y. Ishii, Y. Ono, Y. Morii and T. Kajitani: J. Phys. Soc. Jpn. 71 (2002) 491.
  17. H. Ohta, K. Nomura, M. Orita, M. Hirano, K. Ueda, T. Suzuki, Y. Ikuhara and H. Hosono: Adv. Funct. Mater. 13 (2003) 139.
  18. K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano and H. Hosono: Science 300 (2003) 1269.
  19. H. Ohta, S.-W. Kim. S. Ohta, K. Koumoto, M. Hirano and H. Hosono: Cryst. Growth Des. 5 (2005) 25.
  20. H. Ohta, A. Mizutani, K. Sugiura, M. Hirano, H. Hosono and K. Koumoto: Adv. Mater. 18 (2006) 1649.
  21. J. Shimoyama, S. Horii, K. Otzschi, M. Sano and K. Kishio: Jpn. J. Appl. Phys. 42 (2003) L194.
  22. J. Sugiyama, J. H. Brewer, E. J. Ansaldo, H. Itahara, K. Dohmae, Y. Seno, C. Xia and T. Tani: Phys. Rev. B 68 (2003) 134423.


© 2007 The Japan Institute of Metals
Comments to us :