
Materials Transactions, Vol.45 No.01 (2004) pp.13-23
© 2004 The Japan Institute of Metals
Electron Irradiation Induced Crystallization of the Amorphous Phase in Zr-Cu Based Metallic Glasses with Various Thermal Stability
Takeshi Nagase and Yukichi Umakoshi
Department of Materials Science and Engineering, Graduate School of Engineering, & Handai Frontier Research Center, Osaka University, Suita 565-0871, Japan
The phase stability of the amorphous phase against electron irradiation and the crystallization behavior under electron irradiation were investigated in Zr-Cu based metallic glasses. The phase stability of the amorphous phase against thermal crystallization, i.e., thermal stability was evaluated by the temperature range of supercooled liquid region (Δ Tx). The Δ Tx values for Zr66.7Cu33.3, Zr65.0Al7.5Cu27.5 and Zr65.0Al7.5Ni10.0Cu17.5 alloys were 54 K, 89 K and 119 K, respectively. The amorphous phase of Zr-Cu based metallic glasses was not stable under electron irradiation. The crystallization of fcc-Zr2Cu phase was accelerated by electron irradiation instead of bct-Zr2Cu phase which appeared during thermal annealing. The increase in the thermal stability of the amorphous phase is effective for the decrease in the crystallization rate under electron irradiation, but not always effective in suppressing the occurrence of electron irradiation induced crystallization.
(Received 2003/8/1; Accepted 2003/9/12)
Keywords: zirconium-copper based alloy, metallic glass, thermal stability, phase stability, crystallization, electron irradiation, nanocrystalline structure
PDF (Free)
Table of Contents
REFERENCES
- A. Inoue, K. Ohtera, K. Kita and T. Masumoto: Jpn. J. Appl. Phys. 27 (1988) L2248-L2251.
- A. Inoue, T. Zhang and T. Masumoto: Mater. Trans., JIM 30 (1989) 965-972.
- A. Inoue, T. Zhang and T. Masumoto: Mater. Trans., JIM 31 (1990) 177-183.
- A. Peker and W. L. Johnson, Appl. Phys. Lett: 63 (1993) 2342-2344.
- A. Inoue and J. S. Gook: Mater. Trans., JIM 36 (1995) 1180-1183.
- A. Inoue, N. Nishiyama and T. Matsuda: Mater. Trans., JIM 37 (1996) 181-184.
- K. Amiya, N. Nishiyama, A. Inoue and T. Masumoto: Mater. Sci. Eng. A179/A180 (1994) 692-696.
- X. M. Wang, I. Yoshii, A. Inoue, Y. H. Kim and I. B. Kim: Mater. Trans., JIM 40 (1999) 1130-1136.
- T. Itoi, and A. Inoue: Mater. Trans., JIM 41 (2000) 1256-1261.
- A. Inoue, W. Zhang, T. Zhang, and K. Kurosaka: Acta Mater. 49 (2001) 2645-2652.
- H. Kakiuchi, A. Inoue, M. Onuki, Y. Takano and T. Yamaguchi: Mater. Trans. 42 (2001) 678-681.
- C. Fan, and A. Inoue: Mater. Trans., JIM 38 (1997) 1040-1046.
- C. Fan, A. Takeuchi and A. Inoue: Mater. Trans., JIM 40 (1999) 42-51.
- T. Nagase, Y. Umakoshi and N. Sumida: Mater. Sci. Eng. A 323 (2002) 218-225.
- T. Nagase and Y. Umakoshi: Mater. Sci. Eng. A 343 (2003) 13-21.
- R. Tarumi, K. Takashima and Y. Higo: Appl. Phys. Lett. 81 (2002) 4610-4612.
- R. S. Qin, S. X. Su, J. D. Guo, G. H. He and B. L. Zhou: Nanostructured Mater. 10 (1998) 71-76.
- H. Mizubayashi, N. Kameyama, T. Hao and H. Tanimoto: Phys. Rev. B 64 (2001) 054201-1-054201-10.
- C. Suryanarayana, W. K. Wang, H. Iwasaki and T. Masumoto: Solid State Commun. 34 (1980) 861-863.
- T. Nagase, Y. Umakoshi and N. Sumida: Sci. Tech. Adv. Mater. 3 (2002) 119-128.
- T. Nagase and Y. Umakoshi: Scr. Mater. 48 (2003) 1237-1242.
- T. Nagase and Y. Umakoshi: J. Appl. Phys. 93 (2003) 912-918.
- M. Doi, M. Yoshida, M. Moriyama, T. Imura, T. Masumoto and Y. Yashiro: Mater. Sci. Eng. 23 (1976) 169-172.
- G. Thomas, H. Mori, H. Fujita and R. Sinclair: Scr. Mater. 16 (1982) 589-592.
- H. Mori and H. Fujita: Jpn. J. Appl. Phys. 21 (1982) L494-L496.
- A. Inoue, A. Kitamura and T. Masumoto: Mater. Trans., JIM 20 (1979) 404-406.
- Y. Hirotsu, M. Uehara and M. Ueno: J. Appl. Phys. 59 (1986) 3081-3086.
- T. Zhang, A. Inoue and T. Masumoto: Mater. Trans., JIM 32 (1991) 1005-1010.
- U. Koster, A. Rudiger and J. Meinhardt: Mater. Sci. Forum 307 (1999) 9-16.
- J. Eckert, N. Mattern, M. Zinkevitch and M. Seidel: Mater. Trans., JIM 39 (1998) 623-632.
- B. S. Murty, D. H. Ping, K. Hono and A. Inoue: Appl. Phys. Lett. 76 (2000) 55-57.
- M. Kiritani, K. Yoshida and H. Fujita: Proc. 5th Int. Conf. On High Voltage Electron Microscopy, (Japanese Society of Electron Microscopy, 1977), pp.~501-504.
- A. Inoue: Mater. Trans., JIM 39 (1995) 866-875.
- A. Inoue: Acta Mater. 48 (2000) 279-306.
- H. M. Simpson, and R. L. Chaplin: Phys. Rev. 185 (1969) 958-961.
- A. Wolfenden: Rad. Eff. 21 (1973) 197-199.
- M. Kiritani, N. Yoshida and H. Tanaka: J. Phys. Soc. Jpn. 36 (1974) 720-729.
- M. J. Markin: Philos. Mag. 18 (1968) 637-653.
- K. Urban: Phys. Status Solidi A 4 (1971) 761-772.
- A. Bourret: Phys. Status Solidi A 4 (1971) 813-825.
- D. I. R. Norris: Philos. Mag. 23 (1971) 135-152.
- P. Lucasson and R. M. Walker: Phys. Rev. 127 (1962) 485-500.
- P. Jung, R. L. Chaplin, H. Fenzl, K. Reichelt and P. Wombacher: Phys. Rev. B 8 (1973) 553-561.
- M. Kiritani, N. Yoshida, H. Tanaka and Y. Maehara: J. Phys. Soc. Jpn. 38 (1975) 1677-1686.
- L. M. Howe, D. Phillips, H. Zou, J. Forster, R. Siegele, J. A. Davis, A. T. Motta, J. A. Faldowski and P. R. Okamoto: Nucl. Inst. and Meth. in Phys. Rev. B 118 (1996) 663-669.
[JIM HOME]
[JOURNAL ARCHIVES]
© 2002 The Japan Institute of Metals
Comments to us :
editjt@jim.or.jp